Semi-Aqueous Stripping and Cleaning Formulation for Metal Substrate and Methods for Using Same

ABSTRACT

The present invention relates to semi-aqueous formulations and the method using same, to remove bulk photoresists, post-etched and post-ashed residues, as well as contaminations. The formulation comprises: an alkanolamine, a water miscible organic co-solvent, a quarternary ammonium compound, a non-free acid functionality corrosion inhibitor, and remainder water. The pH is greater than 9.

CROSS REFERENCE TO RELATED APPLICATION

The present patent application claims the benefit of U.S. Provisional Patent Application Ser. No. 61/231,393 filed Aug. 5, 2009.

BACKGROUND OF THE INVENTION

In the manufacture of semiconductors and semiconductor microcircuits, it is frequently necessary to coat substrate materials with a polymeric organic substance. Examples of some substrate materials includes, aluminum, titanium, copper, silicon dioxide coated silicon wafer, optionally having metallic elements of aluminum, titanium, or copper, and the like. Typically, the polymeric organic substance is a photoresist material. This is a material which will form an etch mask upon development after exposure to light for photolithography. In some cases, the photoresist layer needs be reworked. In subsequent processing steps, at least a portion of the photoresist is removed from the surface of the substrate. One common method of removing photoresist from a substrate is by wet chemical means. The wet chemical compositions formulated to remove the photoresist from the substrate should do so without corroding, dissolving, and/or dulling the surface of any metallic circuitry; chemically altering the inorganic substrate; and/or attacking the substrate itself. Another method of removing photoresist is by a dry ash method where the photoresist is removed by plasma ashing using either oxygen or forming gas, such as hydrogen. The residues or by-products may be the photoresist itself or a combination of the photoresist, underlying substrate and/or etch gases. These residues or by-products are often referred to as sidewall polymers, veils or fences.

Increasingly, reactive ion etching (RIE), is the process of choice for pattern transfer during via, metal line and trench formation. For instance, complex semi-conductor devices, such as advanced DRAMS and microprocessors, which require multiple layers of back end of line interconnect wiring, utilize RIE to produce vias, metal lines and trench structures. Vias are used, through the interlayer dielectric, to provide contact between one level of silicon, silicide or metal wiring and the next level of wiring.

Metal lines are conductive structures used as device interconnects. Trench structures are used in the formation of metal line structures. Vias, metal lines and trench structures typically expose metals and alloys, such as Al, Al and Cu alloys, Cu, Ti, TiN, Ta, TaN, W, TiW, silicon or a silicide such as a silicide of tungsten, titanium or cobalt. The RIE process typically leaves a residue or a complex mixture that may include re-sputtered oxide material, organic materials from photoresist, and/or antireflective coating materials used to lithographically define the vias, metal lines and or trench structures.

It is desirable to provide a cleaning formulation and process capable of removing those unwanted materials without corroding, dissolving or dulling the exposed surface of the substrate. In some instances the unwanted materials are polymeric compositions referred to as photoresists. In other instances the unwanted materials to be removed are residues of etching or ashing processes or simply contaminants.

Patents in this technological field include U.S. Pat. No. 6,627,587, U.S. Pat. No. 6,723,691, U.S. Pat. No. 6,851,432 to Naghshineh et al., and published patent application US2006/0016785.

BRIEF SUMMARY OF THE INVENTION

A general goal of this project is to develop a non-hydroxylamine, stripping and cleaning formulation for metal substrate, such as aluminum and copper substrate. Such a stripper will have a lower cost of ownership (COO) than hydroxylamine strippers.

Accordingly, one aspect of the present invention is a formulation for removing bulk photoresists, as well as post-etched and post-ashed residues. The formulation comprises: an alkanolamine, a water miscible organic co-solvent, a quarternary ammonium compound, a non-free acid functionality corrosion inhibitor, and remainder water. The pH is greater than 9. For this invention, “miscible” includes soluble.

According to another aspect of the present invention, a method of removing bulk photoresists as well as post-etched and post-ashed residues from a substrate comprises: applying a formulation as recited above to a substrate to remove the photoresist, post-etched and post-ashed residues, as well as contaminants from the substrate.

DETAILED DESCRIPTION OF THE INVENTION

This invention describes formulations designed primarily for the removal of photoresist, post-etched and post-ashed residues, as well as contaminants from metal substrates. The formulation comprises an alkanolamine, a water miscible organic co-solvent, a quarternary ammonium compound, a corrosion inhibitor, and remainder water. The pH is greater than 9. For this invention, “miscible” includes soluble.

In certain embodiments, alkanolamine includes but is not limited to: monoethanolamine, N-methylethanolamine, triethanolamine, isopropanolamine, diethylhydroxylamine and mixtures thereof.

In certain embodiments, the water miscible organic co-solvent may be glycol ether or a furfuryl alcohol. The glycol ethers may include glycol mono(C₁-C₆)alkyl ethers and glycol di(C₁-C₆)alkyl ethers, such as but not limited to, (C₁-C₂₀)alkane diols, (C₁-C₆)alkyl ethers, and (C₁-C₂₀)alkane diol di(C₁-C₆)alkyl ethers. Examples of glycol ethers are to dipropylene glycol methyl ether, tripropylene glycol methyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monobutyl ether, diethylene glycol monoisobutyl ether, diethylene glycol monobenzyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, triethylene glycol monomethyl ether, triethylene glycol dimethyl ether, polyethylene glycol monomethyl ether, diethylene glycol methyl ethyl ether, triethylene glycol ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether, propylene glycol dimethyl ether, propylene glycol monobutyl ether, propylene glycol, monoproply ether, dipropylene glycol monomethyl ether, dipropylene glycol monopropyl ether, dipropylene glycol monoisopropyl ether, dipropylene glycol monobutyl ether, diproplylene glycol diisopropyl ether, tripropylene glycol monomethyl ether, 1-methoxy-2-butanol, 2-methoxy-1-butanol, 2-methoxy-2-methylbutanol, 1,1-dimethoxyethane and 2-(2-butoxyethoxy) ethanol, and mixtures thereof. More typical examples of glycol ethers are propylene glycol monomethyl ether, propylene glycol monopropyl ether, tri(propylene glycol) monomethyl ether and 2-(2-butoxyethoxy) ethanol. An example of a furfuryl alcohol is Tetrahydrofurfuryl alcohol (THFA).

The total organic solvents (alkanolamine and water miscible organic co-solvent) is in the range of 1 wt % to 50 wt %, while a preferred range is 5 wt % to 40 wt %. The deionized (DI) water is 40 wt % to 95 wt %, while the preferred range is 50 wt % to 80 wt %.

In certain embodiments, the quarternary ammonium compound includes but is not limited to: quarternary ammonium hydroxide, such as tetramethylammonium hydroxide (TMAH), tetraethylammonium hydroxide, tetrabutylammonium hydroxide (TBAH), tetrapropylammonium hydroxide, trimethylethylammonium hydroxide, (2-hydroxyethyl)trimethylammonium hydroxide, (2-hydroxyethyl)triethylammonium hydroxide, (2-hydroxyethyl)tripropylammonium hydroxide, (1-hydroxypropyl)trimethylammonium hydroxide, ethyltrimethylammonium hydroxide, diethyldimethylammonium hydroxide and benzyltrimethylammonium hydroxide and mixtures thereof. The quaternary ammonium compounds are present in an amount ranging from 0.5% to 10% or from 5% to 10% by weight.

In certain embodiments, the composition may include 0.5% to 15% by weight of one or more corrosion inhibitors. Any corrosion inhibitor known in the art for similar applications may be used. Examples of corrosion inhibitors that may be used include: catechol, t-Butylcatechol, pyrogallol, benzotriazole (BZT), resorcinol, esters of gallic acid and mixtures thereof. These are non- free acid functionality corrosion inhibitors which avoid corrosion of metals.

Examples of particular corrosion inhibitors which have free acid functionality and have been shown in the examples below to not adequately protect metals from corrosion include: anthranilic acid, gallic acid, octanoic acid, stearic acid, benzoic acid, isophthalic acid, maleic acid, fumaric acid, D,L-malic acid, malonic acid, phthalic acid, maleic anhydride, phthalic anhydride, carboxybenzotriazole, lactic acid, citric acid, the like and mixtures thereof or with the preceding list of corrosion inhibitors.

Although the present invention has been principally described in connection with cleaning semiconductor substrates, the cleaning formulations of the invention can be employed to clean any substrate or semiconductor device that includes organic and inorganic residues.

EXAMPLES

The following examples are provided for the purpose of further illustrating the present invention, but are by no means intended to limit the same.

Examples of formulations in the invention are given below. The abbreviations used in the formulations are listed below.

-   THFA=Tetrahydrofurfural alcohol -   TMAH=Tetramethylammonium hydroxide -   DPM=Dipropylene glycol methyl ether -   TBAH=Tetrabutylammonium hydroxide -   MEA=Monoethanolamine -   NMEA=N-methylethanolamine -   p-TSA=p-Toluenesulfonic acid -   t-PGME=tripropylene glycol methyl ether -   PG=Propylene glycol -   DEHA=Diethylhydroxyamine

In the following examples, all amounts are given in weight percent and add up to 100 weight percent. The compositions disclosed herein were prepared by mixing the components together in a vessel at room temperature until all solids have dissolved. Examples of certain compositions disclosed herein are set forth in TABLE I.

TABLE I Example A Example B Example C t-PGME 29.00 THFA 29.00 MEA 30.00 p-TSA 1.50 p-TSA 1.50 p-TSA 1.50 TBAH (55%) 6.00 TBAH (55%) 6.00 TBAH (55%) 5.00 Gallic acid 1.50 Gallic acid 1.50 PG 1.00 DI Water 62.00 DI Water 62.00 Gallic acid 1.50 DI Water 61.00 Example D Example E Example F THFA 10.00 THFA 10.00 DPM 10.00 MEA 10.00 MEA 10.00 MEA 12.00 p-TSA 1.50 p-TSA 1.50 p-TSA 1.50 TBAH (55%) 1.00 TBAH (55%) 1.50 TBAH (55%) 1.50 Gallic acid 1.50 Gallic acid 1.50 Gallic acid 2.00 DI Water 76.00 DI Water 75.50 DI Water 73.00 Example G Example H Example I DPM 10.00 DPM 10.00 DPM 10.00 MEA 7.00 MEA 7.00 MEA 12.00 p-TSA 1.50 p-TSA 1.50 p-TSA 1.50 TBAH (55%) 1.50 TBAH (55%) 2.50 TBAH (55%) 2.50 Gallic acid 1.50 Gallic acid 2.00 Gallic acid 1.50 DI Water 78.50 DI Water 77.00 DI Water 72.50 Example J Example K Example L THFA 10.00 THFA 10.00 THFA 10.00 MEA 7.00 MEA 7.00 MEA 12.00 p-TSA 1.50 p-TSA 1.50 p-TSA 1.50 TBAH (55%) 1.50 TBAH (55%) 2.50 TBAH (55%) 1.50 Gallic acid 2.00 Gallic acid 1.50 Gallic acid 1.50 DI Water 78.00 DI Water 77.50 DI Water 73.50 Example M Example N Example O THFA 10.00 DPM 10.00 DPM 10.00 MEA 12.00 MEA 7.00 MEA 7.00 p-TSA 1.50 p-TSA 1.50 p-TSA 1.50 TBAH (55%) 2.50 TBAH (55%) 1.50 TBAH (55%) 1.50 Gallic acid 2.00 catechol 5.00 PG 0.00 DI Water 72.00 Gallic acid 2.00 catechol 5.00 DI Water 73.00 DI Water 75.00 Example P Example Q Example R DPM 10.00 DPM 10.00 DPM 10.00 MEA 7.00 MEA 7.00 MEA 7.00 p-TSA 1.50 p-TSA 1.50 p-TSA 1.50 TBAH (55%) 1.50 TBAH (55%) 1.50 TMAH (25%) 2.00 catechol 0.50 catechol 0.50 catechol 5.00 Gallic acid 1.50 DI Water 79.50 Gallic acid 2.00 DI Water 78.00 DI Water 72.50 Example S Example T Example U DPM 10.00 DPM 10.00 DPM 10.00 MEA 10.00 MEA 10.00 MEA 10.00 TBAH (55%) 2.50 TBAH (55%) 2.50 TBAH (55%) 2.50 Octanoic acid 1.00 Octanoic acid 3.00 Stearic acid 1.00 DI Water 76.50 DI Water 74.50 DI Water 76.50 Example V Example W Example X DPM 10.00 DPM 9.40 DPM 10.00 NMEA 10.00 MEA 17.50 MEA 12.00 TMAH (25%) 2.50 TMAH (25%) 2.40 TMAH (25%) 5.00 Pyrogallol 10.00 t-Butylcatechol 2.40 t-Butylcatechol 2.50 DI Water 67.50 DI Water 68.30 DI Water 70.50 Example Y Example Z Example A1 DPM 10.00 DPM 10.00 DPM 7.40 MEA 10.00 NMEA 12.00 MEA 19.00 TMAH (25%) 2.50 TMAH (25%) 5.00 TMAH (25%) 3.50 t-butylbenzoic 3.00 t-Butylcatechol 2.50 t-Butylcatechol 2.30 acid DI Water 70.50 DI Water 67.80 DI Water 74.50 Example A2 Example A3 Example A4 DPM 7.40 DPM 7.40 DPM 6.50 MEA 22.00 MEA 22.00 MEA 29.00 TMAH (25%) 2.30 TMAH (25%) 3.50 TMAH (25%) 2.00 t-Butylcatechol 2.30 t-Butylcatechol 3.00 t-Butylcatechol 2.60 DI Water 66.00 DI Water 64.10 DI Water 59.90 Example A5 Example A6 Example A7 DPM 12.00 DPM 12.00 DPM 12.00 MEA 22.00 MEA 22.00 MEA 19.00 TMAH (25%) 2.30 TMAH (25%) 3.50 TMAH (25%) 2.30 t-Butylcatechol 3.00 t-Butylcatechol 2.30 t-Butylcatechol 2.30 DI Water 60.70 DI Water 60.20 DI Water 64.40 Example A8 Example A9 DPM 12.00 DPM 17.00 MEA 19.00 MEA 14.00 TMAH (25%) 3.50 TMAH (25%) 2.50 t-Butylcatechol 3.00 t-Butylcatechol 2.00 DI Water 62.50 DEHA 3.00 DI Water 61.50 Example A10 Example A11 DPM 10.00 TPM 13.00 MEA 12.00 MEA 13.00 TMAH (25%) 5.00 TMAH (25%) 4.34 t-Butylcatechol 2.50 t-Butylcatechol 3.00 DEHA 2.00 DEHA 1.70 DI Water 68.50 PG 4.34 DI Water 60.62

Complex semiconductor devices, such as DRAMs and microprocessors, which require multiple layers of back-end-of-line (BEOL) interconnect wiring, utilize reactive ion etching (RIE) to produce vias, metal lines and Pads. The vias, used in the cleaning experiments, were through an interlayer dielectric to an etch stop, such as; TiN, SiN, etc., while the metal lines were conductive structures used as device interconnects.

Some of the substrates (Metal 1 to 3) were ashed, while others were not ashed. When the substrates were ashed, the main residues to be cleaned were etchant residues. If the substrates were not ashed, then the main residues to be cleaned or stripped were both etch residues and photoresists. Metals 1 to 3 are various circuit structures, each fabricated from aluminum metal.

Cleaning tests were run using 305 mL of the cleaning compositions in a 400 mL beaker with a ½″ round Teflon stir bar set at 600 rpm. The cleaning compositions were heated to the desired temperature, indicated below, on a hot plate, if necessary. Wafer segments approximately 1″×1″ in size were immersed in the compositions under the following set of conditions: process time ranging from 1 minute to 30 minutes, at a process temperature ranging from 25° C. to 75° C.

The cleaning results are summarized in TABLE II.

TABLE II Via Pad Strippers Unashed ashed Unashed ashed Metal 1 Metal 2 Metal 3 Example N/A N/A N/A N/A Cleaned Cleaned Partially A cleaned Example N/A N/A N/A N/A Cleaned Cleaned Partially B cleaned Example N/A N/A N/A N/A Cleaned Cleaned Not C cleaned Example N/A N/A N/A N/A Cleaned Cleaned Partially D cleaned Example N/A N/A N/A N/A Cleaned Cleaned Partially E cleaned Example N/A N/A N/A N/A Cleaned Cleaned Not F cleaned Example N/A N/A N/A N/A Cleaned Cleaned Not G cleaned Example N/A N/A N/A N/A Cleaned Cleaned Partially H cleaned Example Partially cleaned Partially cleaned Etched Etched Etched I cleaned cleaned (corroded) (corroded) (corroded) Example Partially cleaned Partially Partially Etched Etched Etched J cleaned cleaned cleaned (corroded) (corroded) (corroded) Example Partially Partially Partially Partially Etched Etched Etched L cleaned cleaned cleaned cleaned (corroded) (corroded) (corroded) Example Partially Partially Partially Partially Etched Etched Etched M cleaned cleaned cleaned cleaned (corroded) (corroded) (corroded) Example Partially Partially Partially Partially Etched Etched Etched N cleaned cleaned cleaned cleaned (corroded) (corroded) (corroded) Example Partially Partially Partially Partially Etched Etched Etched O cleaned cleaned cleaned cleaned (corroded) (corroded) (corroded) Example Partially Partially Partially Partially Etched Etched Etched P cleaned cleaned cleaned cleaned (corroded) (corroded) (corroded) Example Partially Cleaned Partially cleaned Etched Etched Etched Q cleaned cleaned (corroded) (corroded) (corroded) Example Partially Cleaned Partially Cleaned Etched Etched Etched R cleaned cleaned (corroded) (corroded) (corroded) Example Partially Partially Partially cleaned Etched Etched Etched S cleaned cleaned cleaned (corroded) (corroded) (corroded) Example Cleaned Cleaned Cleaned Cleaned Etched Etched Etched T (corroded) (corroded) (corroded) Example Cleaned Cleaned Cleaned cleaned Partially Partially Partially U corroded corroded corroded Example Cleaned Cleaned Cleaned Cleaned Cleaned Cleaned Cleaned V Example Cleaned Cleaned Cleaned Partially Cleaned Cleaned Cleaned W cleaned Example Partially Cleaned Cleaned Partially Cleaned Cleaned Partially X cleaned cleaned cleaned Example Cleaned Cleaned Cleaned Cleaned Partially Partially Partially Y corroded corroded corroded Example Cleaned Cleaned Cleaned Cleaned Partially Cleaned Cleaned Z corroded Example Cleaned Cleaned Cleaned Cleaned Partially Cleaned Cleaned A1 corroded Example Cleaned Cleaned Cleaned Cleaned Cleaned Cleaned Partially A2 corroded Example Cleaned Cleaned Cleaned Cleaned Partially Partially Partially A3 corroded corroded corroded Example Cleaned Cleaned Cleaned Cleaned Partially Partially Cleaned A4 corroded corroded Example Cleaned Cleaned Cleaned Cleaned Partially Partially Cleaned A5 corroded corroded Example Cleaned Cleaned Cleaned Cleaned Cleaned Cleaned Cleaned A6 Example Cleaned Cleaned Cleaned Cleaned Cleaned Cleaned Cleaned A7 Example Cleaned cleaned cleaned Partially Cleaned Cleaned Cleaned A8 cleaned Example Cleaned Cleaned Cleaned Cleaned Cleaned Cleaned cleaned 9 Example Cleaned Cleaned Cleaned Cleaned Sl. Corr. Sl. Corr. Cleaned 10 (cleaned) (cleaned) Example Cleaned Cleaned Cleaned Cleaned Cleaned Sl. Corr. Cleaned 11 (cleaned) Sl. Corr. = slightly corroded

Among the different corrosion inhibitors used, formulations having pyrogallol and t-butylcatechol performed much better (Examples V, W-X, Z, A1-A8) in comparison with the commonly used corrosion inhibitors: gallic acid (Examples A-N), octanoic acid (Examples S-T), stearic acid(Example U), t-butylbenzoic acid (Example Y), catechol(Examples O, Q), or the combination of catechol and gallic acid (Examples N, P, R). The data in Table II indicates that the formulations using TMAH in 25% dilutions and corrosion inhibitors that did not have free acid functionality, either carboxylic acid or sulfonic acid (“non-free acid functionality”) performed better in lifting photoresist and avoiding corrosion of metals.

The foregoing examples and description of the preferred embodiments should be taken as illustrating, rather than as limiting the present invention, as defined by the claims. As will be readily appreciated, numerous variations and combinations of the features set forth above can be utilized without departing from the present invention, as set forth in the claims. Such variations are not regarded as a departure from the spirit and scope of the invention, and all such variations are intended to be included within the scope of the following claims. 

1. A semi-aqueous stripping and cleaning formulation, comprising: a. alkanolamine; b. water miscible organic co-solvent; c. quarternary ammonium compound; d. non-free acid functionality corrosion inhibitor; and, e. water; wherein pH of the formulation is greater than
 9. 2. The formulation as claimed in claim 1, wherein the alkanolamine is selected from the group consisting of monoethanolamine, N-methylethanolamine, triethanolamine, isopropanolamine, diethylhydroxylamine, and mixtures thereof; the water miscible organic co-solvent is selected from the group consisting of glycol ether and furfuryl alcohol; and total weight percent for the alkanolamine and the water miscible organic co-solvent is from 1% to 50% by weight.
 3. The formulation as claimed in claim 1, wherein the water miscible organic co-solvent is selected from the group consisting of propylene glycol (PG), dipropylene glycol methyl ether(DPM), tripropylene glycol methyl ether(t-PGME), propylene glycol methyl ether(PGME), propylene glycol propyl ether (PGPE), tri(propylene glycol) monomethyl ether, 2-(2-butoxyethoxy) ethanol, tetrahydrofurfuryl alcohol (THFA), and mixtures thereof.
 4. The formulation as claimed in claim 1, wherein the quarternary ammonium compound is from 0.5% to 10% by weight and selected from the group consisting of tetramethylammonium hydroxide (TMAH), tetraethylammonium hydroxide, tetrabutylammonium hydroxide (TBAH), tetrapropylammonium hydroxide, trimethylethylammonium hydroxide, (2-hydroxyethyl)trimethylammonium hydroxide, (2-hydroxyethyl)triethylammonium hydroxide, (2-hydroxyethyl)tripropylammonium hydroxide, (1-hydroxypropyl)trimethylammonium hydroxide, ethyltrimethylammonium hydroxide, diethyldimethylammonium hydroxide, benzyltrimethylammonium hydroxide and mixtures thereof.
 5. The formulation as claimed in claim 1, wherein the corrosion inhibitor is from 0.5% to 15% by weight and selected from the group consisting of catechol, t-Butylcatechol, pyrogallol, ester of gallic acid, and mixtures thereof.
 6. A semi-aqueous stripping and cleaning formulation, comprising: a. an alkanolamine selected from the group consisting of monoethanolamine, N-methylethanolamine, and mixtures thereof; b. a water miscible organic co-solvent selected from propylene glycol (PG), dipropylene glycol methyl ether(DPM), tripropylene glycol methyl ether(t-PGME), tetrahydrofurfuryl alcohol (THFA), and mixtures thereof; c. from 0.5% to 10% by weight of a quarternary ammonium compound selected from the group consisting of tetramethylammonium hydroxide (TMAH), tetraethylammonium hydroxide, tetrabutylammonium hydroxide (TBAH), and mixtures thereof; d. from 0.5% to 15% by weight of a corrosion inhibitor selected from, t-Butylcatechol, pyrogallol, and mixtures thereof; e. remainder water; wherein a total percent weight of the alkanolamine and the water miscible organic co-solvent is from 5% to 40% by weight, and the pH of the formulation is greater than
 9. 7. The formulation as claimed in claim 6, wherein the water miscible organic co-solvent is dipropylene glycol methyl ether(DPM).
 8. A method of removing photoresist, etch or ash residue, and contaminants from a semiconductor substrate, comprising: contacting the semiconductor substrate with a formulation, comprising: a. alkanolamine; b. water miscible organic co-solvent; c. quarternary ammonium compound; d. non-free acid functionality corrosion inhibitor; and e. water; wherein the pH of the formulation is greater than
 9. 9. The method as claimed in claim 8, wherein the alkanolamine is selected from the group consisting of monoethanolamine, N-methylethanolamine, triethanolamine, isopropanolamine, diethylhydroxylamine, and mixtures thereof; the water miscible organic co-solvent is selected from the group consisting of glycol ether and furfuryl alcohol; and a total weight percent for the alkanolamine and the water miscible organic co-solvent is from 5% to 40% by weight.
 10. The method as claimed in claim 8, wherein the water miscible organic co-solvent is selected from the group consisting of Propylene glycol (PG), dipropylene glycol methyl ether(DPM), tripropylene glycol methyl ether(t-PGME), propylene glycol methyl ether(PGME), propylene glycol propyl ether (PGPE), tri(propylene glycol) monomethyl ether, 2-(2-butoxyethoxy) ethanol, tetrahydrofurfuryl alcohol (THFA), and mixtures thereof.
 11. The method as claimed in claim 8, wherein the quarternary ammonium compound is from 0.5% to 10% by weight and selected from the group consisting of tetramethylammonium hydroxide (TMAH), tetraethylammonium hydroxide, tetrabutylammonium hydroxide (TBAH), tetrapropylammonium hydroxide, trimethylethylammonium hydroxide, (2-hydroxyethyl)trimethylammonium hydroxide, (2-hydroxyethyl)triethylammonium hydroxide, (2-hydroxyethyl)tripropylammonium hydroxide, (1-hydroxypropyl)trimethylammonium hydroxide, ethyltrimethylammonium hydroxide, diethyldimethylammonium hydroxide, benzyltrimethylammonium hydroxide and mixtures thereof.
 12. The method as claimed in claim 8, wherein the corrosion inhibitor is from 0.5% to 15% by weight and selected from the group consisting of catechol, t-Butylcatechol, pyrogallol, ester of gallic acid, and mixtures thereof.
 13. A semi-aqueous stripping and cleaning formulation, comprising: a. 10% by weight N-methylethanolamine; b. 10% by weight dipropylene glycol methyl ether(DPM); c. 0.6% by weight tetramethylammonium hydroxide (TMAH); d. 10% by weight pyrogallol; and e. remainder water; wherein pH of the formulation is greater than
 9. 14. A semi-aqueous stripping and cleaning formulation, comprising: a. 19-22% by weight monoethanolamine; b. 12% by weight dipropylene glycol methyl ether(DPM); c. 2.3-3.5% by weight tetramethylammonium hydroxide (TMAH); d. 2.3% by weight t-Butylcatechol; and e. remainder water; wherein pH of the formulation is greater than
 9. 15. A method of removing photoresist, etch or ash residue, and contaminants from a semiconductor substrate, comprising: contacting the semiconductor substrate with the formulation as claimed in claim
 13. 16. A method of removing photoresist, etch or ash residue, and contaminants from a semiconductor substrate, comprising: contacting the semiconductor substrate with the formulation as claimed in claim
 14. 17. The semi-aqueous stripping and cleaning formulation of claim 1 wherein the quaternary ammonium compound is a 25% concentration in water of tetramethylammonium hydroxide.
 18. The semi-aqueous stripping and cleaning formulation of claim 6 wherein the quaternary ammonium compound is a 25% concentration in water of tetramethylammonium hydroxide.
 19. The semi-aqueous stripping and cleaning formulation of claim 13 wherein the tetramethylammonium hydroxide is a 25% concentration in water.
 20. The semi-aqueous stripping and cleaning formulation of claim 14 wherein the tetramethylammonium hydroxide is a 25% concentration in water. 